產品型號: PECVD
PECVD (Plasma Enhanced CVO) is CVD (Chemical Vapor Deposition) using plasma, whichuses glow discharge generated from decomposition of source gas . Powers in various range offrequencies (O- 13.56MHz) are used in order to generate glow discharges.
PDF規格表:
|
Size |
Custom-made |
|
Precursor |
mass flow control system Ar, N2, O2, C2H2, CH4, C6H6, etc. |
|
Base Pressure |
-10 -6 torr |
|
Bias Power |
0 – R.F. |
|
Operation |
Fully Automatic/Semi Automatic |
|
Cooling |
water cooled |